一、電鍍設備有哪些結構
電鍍設備是用來對金屬或非金屬表面進行電鍍的一種設備。其中涉及到多種材料、化學物質和機械設備的結合,因此設備構造十分重要。一般來講,電鍍設備的基本構(gou)造由前處理裝(zhuang)(zhuang)置、電鍍槽、電源裝(zhuang)(zhuang)置、控制系統、后處理裝(zhuang)(zhuang)置等(deng)部(bu)分組成。
1、前處理裝置
前處(chu)理(li)裝置是電(dian)鍍設備中至關重要的(de)(de)(de)一部分,它有助于保證電(dian)鍍層的(de)(de)(de)質量和不漏電(dian)現象的(de)(de)(de)發生。前處(chu)理(li)裝置通常由超聲(sheng)波清洗機、酸洗槽(cao)(cao)、浸(jin)鍍槽(cao)(cao)等(deng)組成。超聲(sheng)波清洗機能夠有效(xiao)地去(qu)除表(biao)面上的(de)(de)(de)油脂等(deng)附著物;酸洗槽(cao)(cao)能夠去(qu)除表(biao)面銹(xiu)蝕、氧化等(deng)不良物質,使表(biao)面更(geng)加光滑;浸(jin)鍍槽(cao)(cao)可以對鍍層進行預處(chu)理(li),提(ti)高電(dian)鍍效(xiao)果。
2、電鍍槽
電(dian)(dian)鍍(du)(du)槽是(shi)(shi)電(dian)(dian)鍍(du)(du)設備的(de)關鍵部分之(zhi)一(yi),一(yi)般(ban)包(bao)括負極(ji)、陽(yang)(yang)極(ji)、電(dian)(dian)解(jie)(jie)質以及攪拌器(qi)等。負極(ji)通(tong)(tong)常是(shi)(shi)待鍍(du)(du)物體(ti),陽(yang)(yang)極(ji)則是(shi)(shi)黃銅或其他金屬,電(dian)(dian)解(jie)(jie)質則是(shi)(shi)指含有離子的(de)電(dian)(dian)解(jie)(jie)液。電(dian)(dian)流通(tong)(tong)過電(dian)(dian)解(jie)(jie)質時(shi)會導(dao)致(zhi)陽(yang)(yang)極(ji)溶解(jie)(jie),離子向陰(yin)極(ji)或待鍍(du)(du)物體(ti)移(yi)動(dong)并(bing)沉積,該(gai)過程稱為電(dian)(dian)沉積,最終形成電(dian)(dian)鍍(du)(du)層(ceng)。同時(shi)攪拌器(qi)能(neng)夠保證電(dian)(dian)解(jie)(jie)質的(de)均(jun)勻(yun)性,增(zeng)加電(dian)(dian)鍍(du)(du)層(ceng)的(de)厚度和均(jun)勻(yun)性。
3、電源裝置
電(dian)(dian)(dian)(dian)源裝置(zhi)(zhi)是電(dian)(dian)(dian)(dian)鍍(du)設(she)備(bei)中的必要(yao)部(bu)分,其作用是將(jiang)電(dian)(dian)(dian)(dian)能(neng)轉化為電(dian)(dian)(dian)(dian)流(liu),進而提供(gong)電(dian)(dian)(dian)(dian)鍍(du)槽中所(suo)需的電(dian)(dian)(dian)(dian)能(neng)。根(gen)據電(dian)(dian)(dian)(dian)鍍(du)物體的不(bu)同,電(dian)(dian)(dian)(dian)源裝置(zhi)(zhi)也有所(suo)不(bu)同,一般(ban)主要(yao)分為直流(liu)電(dian)(dian)(dian)(dian)源和(he)交流(liu)電(dian)(dian)(dian)(dian)源兩種。
4、控制系統
控(kong)(kong)(kong)制(zhi)(zhi)系統是(shi)電鍍設備(bei)的(de)“大(da)腦”,負(fu)責監控(kong)(kong)(kong)和控(kong)(kong)(kong)制(zhi)(zhi)整個設備(bei)的(de)運行(xing)情況(kuang),保證設備(bei)能夠正常工作(zuo)。控(kong)(kong)(kong)制(zhi)(zhi)系統通常由溫度控(kong)(kong)(kong)制(zhi)(zhi)器(qi)(qi)(qi)、電流控(kong)(kong)(kong)制(zhi)(zhi)器(qi)(qi)(qi)、自(zi)動計(ji)時(shi)(shi)器(qi)(qi)(qi)、水位器(qi)(qi)(qi)等組成(cheng),同時(shi)(shi)還會(hui)加入電鍍層的(de)檢測(ce)、管(guan)理(li)、保養(yang)等功能。
5、后處理裝置
后(hou)處(chu)理(li)裝置是(shi)為了(le)提高電鍍層的穩定性(xing)和表(biao)面(mian)光潔度而設置的。后(hou)處(chu)理(li)裝置通常由沖(chong)洗(xi)槽、烘干(gan)槽等部分組(zu)成,其中沖(chong)洗(xi)槽能(neng)夠(gou)去除(chu)疏(shu)水(shui)性(xing)化(hua)合物,保證表(biao)面(mian)的光滑度,烘干(gan)槽則能(neng)夠(gou)去除(chu)水(shui)分。
二、電鍍生產線設備的基本原理是什么
電(dian)鍍(du)是(shi)一種通過(guo)電(dian)解方(fang)法在(zai)金(jin)(jin)屬(shu)(shu)表面沉積一層金(jin)(jin)屬(shu)(shu)或(huo)金(jin)(jin)屬(shu)(shu)合(he)金(jin)(jin)的(de)過(guo)程,這層金(jin)(jin)屬(shu)(shu)或(huo)金(jin)(jin)屬(shu)(shu)合(he)金(jin)(jin)具有(you)所(suo)需要(yao)的(de)光澤、硬度、耐磨(mo)、耐腐蝕等(deng)特(te)性。以下是(shi)大家應了解的(de)幾個原理要(yao)點:
1、電極反應:電(dian)鍍過(guo)程(cheng)中,工件作為陰(yin)極,需要發生還原反(fan)(fan)應,而電(dian)解(jie)液(ye)中的金屬離子作為陽極,需要發生氧化反(fan)(fan)應。通過(guo)控(kong)制電(dian)流密度和電(dian)極電(dian)位等參數,可(ke)以影(ying)響電(dian)極反(fan)(fan)應的進行速(su)度和沉積物的結構(gou)。
2、沉積速度:電鍍過程中,電流(liu)密度(du)和(he)電解液濃度(du)是(shi)影(ying)響(xiang)沉積(ji)(ji)速(su)(su)度(du)的主要因素。電流(liu)密度(du)越(yue)大,沉積(ji)(ji)速(su)(su)度(du)越(yue)快,但(dan)過高的電流(liu)密度(du)會導致工(gong)件表(biao)面粗(cu)糙、燒傷等(deng)問題。此外,電解液濃度(du)也會影(ying)響(xiang)沉積(ji)(ji)速(su)(su)度(du)和(he)沉積(ji)(ji)物結構(gou)。
3、電流效率:電(dian)(dian)鍍(du)過程中,電(dian)(dian)流效率是評估電(dian)(dian)鍍(du)效果的一個重(zhong)要參數(shu)。電(dian)(dian)流效率越高,沉(chen)積物的質量和附著力越好(hao)。電(dian)(dian)流效率受到電(dian)(dian)極反應、電(dian)(dian)解液濃度(du)、電(dian)(dian)流密度(du)等因素的影響(xiang)。
4、鍍層質量:鍍(du)(du)層(ceng)(ceng)質(zhi)(zhi)量是電鍍(du)(du)生產(chan)線廠(chang)家需(xu)要(yao)(yao)關注(zhu)的重要(yao)(yao)方面。優質(zhi)(zhi)的鍍(du)(du)層(ceng)(ceng)應(ying)該具有光滑、細膩、無針孔(kong)、耐腐(fu)蝕等(deng)特點(dian)。為了(le)提高(gao)鍍(du)(du)層(ceng)(ceng)質(zhi)(zhi)量,需(xu)要(yao)(yao)合理(li)控制電極(ji)反應(ying)、沉(chen)積(ji)速度、電流效率等(deng)因素。